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NIST-SS26-CHIPS-120
Response Deadline
May 29, 2026, 9:00 PM(EDT)14 days
Eligibility
Contract Type
Special Notice
THIS IS A COMBINED SOURCES SOUGHT NOTICE AND NOTICE OF INTENT TO SOLE SOURCE
Announcement Number: NIST-SS26-CHIPS-120
Subject: Notice of Intent to Noncompetitively Acquire Tilt Stage for SEM
This notice is not a request for a quotation. A solicitation document will not be issued, and quotations will not be requested.
This acquisition is being conducted under the authority of RFO 12.102(a). The North American Industry Classification System (NAICS) code for this acquisition is 334516, Analytical Laboratory Instrument Manufacturing.
NIST intends to award a non-competitive contract to Kleindiek, Inc. for a tilt stage for NIST’s Zeiss Supra SEM.
BACKGROUND
The National Institute of Standards and Technology (NIST) Microsystems and Nanotechnology Division (MND) develops integrated microsystems by advancing the state of the art in nanofabrication, enabling the transfer of NIST measurement technologies to the industrial, academic, and government communities.
The MND owns a Zeiss Supra SEM that serves CHIPS Metrology project GC6.01 – Universal Microscopy Standards. To meet mission-critical requirements, the MND needs to procure a tilt-stage upgrade for this microscope. This acquisition will provide the Division and CHIPS Metrology with essential capabilities for calibration and measurement method development, assessment of nanofabrication processes, and characterization of microscopy standards.
Scanning electron microscopy (SEM) is a critical tool for semiconductor manufacturing metrology. NIST is developing standards and methods for calibrating the landing angle of an electron beam in scanning electron microscopy. Such calibration is critical to ensure dimensional accuracy for a variety of metrology applications, such as overlay assessment. The standards consist of arrays of nanostructures, the images of which exhibit features that depend on the relative angle of the electron beam and the sample, and the nanostructure geometry. The realization of standards that are fit for dissemination requires careful decoupling of all sources that affect the measurement of the electron beam landing angle. These sources include the angle of the electron beam, the orientation of the sample in the SEM, and the nanostructure geometry. In particular, assessment of the effects of fabrication processes on nanostructure geometry requires control over the orientation of the sample relative to the electron beam in all three Euler angles. Such control is not possible with the current stage installed on the Zeiss Supra SEM, requiring a stage upgrade to access the additional degrees of freedom. Without this ability, a primary objective of the project to deliver standards for electron beam goniometry to stakeholders cannot be realized.
The minimum requirements are outlined below.
Line Item 0001:
Line Item 0001:
Description: Tilt stage for a Zeiss Supra SEM
Quantity: 1
To meet mission-critical requirements, CHIPS Metrology project 6.01 - Universal Microscopy Standards needs to procure a tilt stage upgrade for a Zeiss Supra SEM. This upgrade is necessary to enable dynamic control over sample orientation relative to the microscope during imaging. This capability is necessary for the development of calibration methods for electron beam landing angle, to provide measurement feedback for fabrication process development, and to characterize microscopy standards.
Only Kleindiek, Inc. is able to provide a tilt stage upgrade for a Zeiss Supra SEM that enables (1) dynamic control over sample orientation in all three Euler angles; and (2) operation during imaging.
Meeting these requirements is critical for the development and dissemination of microscopy standards for measurement and calibration of electron beam landing angle. These standards are based on a parallax effect when imaging conical structures with an electron beam, and assessment of the symmetry of the structures is crucial. In developing fabrication methods for such standards, samples must be leveled relative to the electron beam in order to assess sidewall symmetry across replicate patterns, wafers, and batches. Prior to dissemination of standards, structure sidewall angle must be characterized to ensure subsequent calibrations properly decouple any effects of the standard itself from the microscopy system being used to measure the standard. Sample leveling will be accomplished by analyzing SEM micrographs in real time and adjusting sample orientation with high fidelity. Such assessment and adjustment is not possible with sample stages that must be manually set and reset outside of the SEM vacuum chamber.
Kleindiek, Inc. is the only manufacturer that provides a stage that can be controlled electronically while mounted inside the SEM and during active imaging. Other vendors can only offer sample stages that are manually adjusted prior to loading into the SEM vacuum chamber and thus sample orientation cannot be modified during imaging. Kleindiek, Inc. does not have any authorized resellers.
NIST conducted market research from March 2026 through May 2026 by conducting online searches and discussions with sources to determine what sources could meet NIST’s minimum requirements. The results of that market research revealed that only KLEINDIEK, INC., 3526 3RD ST N, ARLINGTON, VA 22201, United States, UEI: CZ7ADELZDL61 appears to be capable of meeting NIST’s requirements.
HOW TO RESPOND TO THIS NOTICE
In responding to this notice, please DO NOT PROVIDE PROPRIETARY INFORMATION. Include only the following information provided below. Submit the response by email to the Primary Point of Contact and, if specified, to the Secondary Point of Contact no later than 5/22/65, 5:00pm ET.
QUESTIONS REGARDING THIS NOTICE
Questions regarding this notice must be submitted via email to the Primary Point of Contact and the Secondary Point of Contact. Questions must be submitted so that they are received by 5:00 p.m. Eastern Time on 5/19/26 to receive a government response prior to the close of this notice. Questions will be anonymized and answered via sources sought notice amendment following the question submission deadline.
IMPORTANT NOTES
Cielo Ibarra
DEPARTMENT OF COMMERCE
NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
DEPT OF COMMERCE NIST
DEPT OF COMMERCE NIST
ACQUISITION MANAGEMENT DIVISION
100 BUREAU DR.
GAITHERSBURG, MD, 20899
NAICS
Analytical Laboratory Instrument Manufacturing
PSC
LABORATORY EQUIPMENT AND SUPPLIES