Atomic Layer Deposition (ALD) Reactor System

Description

COMBINED SYNOPSIS / SOLICITATION FOR COMMERCIAL ITEMS

This is a combined synopsis/solicitation for commercial products or commercial services prepared in accordance with part 12. This announcement constitutes the only solicitation. Offers are being requested and a separate written solicitation will not be issued.

Solicitation number N00173-26-Q-TB02 is issued as a request for quotation (RFQ) for an atomic layer deposition (ALD) reactor for the uniform and conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates of high aspect ratio surface topographies using both traditional thermal atomic layer deposition (ALD) and plasma enhanced ALD (PE-ALD) modes.

This acquisition is set-aside for small business concerns. This solicitation incorporates provisions and clauses by reference. The full text of provisions and clauses may be accessed electronically at www.acquisition.gov.

The Defense Priorities and Allocations System (DPAS) and assigned rating are DO-C9.

See solicitation attachment, below.

Classifications

NAICS

334513

Instruments and Related Products Manufacturing for Measuring, Displaying, and Controlling Industrial Process Variables

31-33├Manufacturing

334├Computer and Electronic Product Manufacturing

3345├Navigational, Measuring, Electromedical, and Control Instruments Manufacturing

33451├Navigational, Measuring, Electromedical, and Control Instruments Manufacturing

334513└Instruments and Related Products Manufacturing for Measuring, Displaying, and Controlling Industrial Process Variables

PSC

6640

LABORATORY EQUIPMENT AND SUPPLIES

66├INSTRUMENTS AND LABORATORY EQPT

6640└Laboratory Equipment and Supplies

Set-Aside

SBA

Total Small Business Set-Aside (FAR 19.5)

Documents

Primary Contact

Secondary Contact